CONNECT WITH US
AI & Deeptech

AI & Deeptech

Self-Heating And Parasitics Challenge Multi-Tier CFET Scaling (TU Munich, IIT Kanpur)

Semiconductor Engineering logo

Published on

Add as a preferred source on Google
Self-Heating And Parasitics Challenge Multi-Tier CFET Scaling (TU Munich, IIT Kanpur)

Researchers at the Technical University of Munich and Indian Institute of Technology Kanpur published “Self-Heating and Parasitic Effects in Multi-Tier CFET Design.”

Abstract Excerpt:
“We study the impact of self-heating effects (SHEs) and middle of line (MOL) and back-end of line (BEOL) induced parasitics on multi-tier CFET design, where multiple nanosheet devices are vertically stacked. We analyze and compare the four-tier complementary FET (CFET) design with the conventional two-tier CFET, using TCAD models calibrated to experimental measurements. In addition, TCAD simulations are used to model and analyze SHE-induced heat distribution and temperature profiles and to extract the detailed parasitic RC network from 3-D models of CMOS inverters designed with full MOL and BEOL interconnects.”

Shahin, Sufia, Mahdi Benkhelifa, Yogesh Singh Chauhan, and Hussam Amrouch. “Self-Heating and Parasitic Effects in Multi-Tier CFET Design.” IEEE Journal on Exploratory Solid-State Computational Devices and Circuits 12 (2026): 153–158. https://doi.org/10.1109/JXCDC.2026.3704373. License.



Source link

Disclaimer

We strive to uphold the highest ethical standards in all of our reporting and coverage. We TheMorningPulse.fyi want to be transparent with our readers about any potential conflicts of interest that may arise in our work. It's possible that some of the investors we feature may have connections to other businesses, including competitors or companies we write about. However, we want to assure our readers that this will not have any impact on the integrity or impartiality of our reporting. We are committed to delivering accurate, unbiased news and information to our audience, and we will continue to uphold our ethics and principles in all of our work. Thank you for your trust and support.