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Hyper-NA EUV: The Next Extension Beyond High NA Lithography (Carl Zeiss, ASML)

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Hyper-NA EUV: The Next Extension Beyond High NA Lithography (Carl Zeiss, ASML)

Researchers at Carl Zeiss SMT and ASML published a technical paper titled “Hyper-NA: a system with a numerical aperture of at least 0.75.”

The researchers examine Hyper-NA EUV lithography with a numerical aperture of at least 0.75 as a path beyond current 0.55-NA High-NA systems, including the optical architecture, resolution potential, reticle 3D effects, polarization, and requirements for extending the existing EUV ecosystem.

Patra, Michael, Heiko Feldmann, Jens Timo Neumann, and Gerardo Bottiglieri. “Hyper-NA: a system with a numerical aperture of at least 0.75.” Journal of Micro/Nanopatterning, Materials, and Metrology 25, no. 4 (2026): 041807. https://doi.org/10.1117/1.JMM.25.4.041807



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