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Chip Industry Technical Paper Roundup: Oct. 27

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Chip Industry Technical Paper Roundup: Oct. 27

Institute of Science Tokyo , Yokohama National University , AIST , PETRA

Irradiation-Source-Dependent Tone Conversion in Dry-Deposited Halogenated Amorphous Zeolitic Imidazolate Framework Resists for Electron-Beam and EUV Lithography

KU Leuven , Kunsan National University , Vrije Universiteit Brussel , imec

NN-Based Transistor Modeling for Ultra-Fast SPICE Simulation and Standard Cell Library Characterization

Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber : Film properties and imaging performance



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