Today, anyone with a large enough artificial intelligence model can generate millions of new material designs in minutes. Unfortunately, that hasn’t led to a huge leap in the number of new materials being used to improve the performance of products like computer chips and rockets.

One reason for the translation gap is that current models don’t reliably factor in the chemical stability of the materials they generate, and unstable materials aren’t very useful in the real world. That forces industries to allocate huge computational budgets to screening out all the unstable materials they generate, in some cases leaving behind a tiny fraction of usable options.

Now, MIT researchers have developed a framework that can be applied at the beginning of the materials generation process to vastly improve the stability rate while achieving targeted material properties. It works by ensuring every design satisfies certain key rules of chemistry relating to the electrons around the materials’ atoms before the expensive generation step begins. The researchers call their approach “crystal generator with valence-constrained design, or CrysVCD.

In a paper published today in Nature Computational Science , the researchers show how CrysVCD allowed several commonly used material models to meet those valence shell rules more often, and used it to achieve high lattice-dynamics stability — a stringent stability test — in nearly 70 percent of computational material generations. They also showed the approach could support the creation of materials with specific desired properties, like high thermal conductivity or high dielectric constant, which is important for computer chips and data centers.

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